| 摘要 |
PURPOSE: A photo mask blank is provided to be cured with high sensitivity by exposure, to ensure excellent storage stability when containing a large amount of light shielding materials. CONSTITUTION: A photo mask blank has a photosensitive composition layer on a substrate. The photosensitive composition layer comprises (A) at least one optical brightener represented by chemical formulas (I-1) ~ (I-15), (B) a polymerization initiator, (C) a compound with an ethylenically unsaturated bond, (D) a binder polymer, and (E) a light-blocking material. |
