| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve a production yield of a lithographic apparatus and improve a method of manufacturing a device. <P>SOLUTION: The lithographic apparatus includes an optical element, such as, immersion fluid reservoir, supported at least in part by a gas bearing etc. A surrounding structure is provided that surrounds a substrate to enable an edge of the substrate to be illuminated by the lithographic apparatus. A level parameter for substrate, such as the thickness of the substrate, is measured by a thickness sensor etc. By means of an actuator, a substrate table is positioned with respect to the surrounding structure, so that the surface of the substrate is placed at a substantially same level as that of the surface of the surrounding structure, thereby enabling the optical element to be transferred between the surface of the substrate and the surface of the surrounding structure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
