| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photocuring type nano-imprint processing apparatus excellent in minute processing and economic properties. <P>SOLUTION: In the processing apparatus, a mold with an uneven pattern formed is coated with a resist, a substrate and the resist are brought into contact with each other, and the resist to which the pattern is transferred is transferred to the substrate by curing the resist. A means is provided for intruding the resist into the uneven pattern before the resist is brought in contact with the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
