POLISHING SLURRY, PROCESS FOR PRODUCING SAME, METHOD OF POLISHING, AND PROCESS FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK

摘要

A process for producing a polishing slurry which contains fine ceria crystal particles or fine ceria-zirconia solid-solution crystal particles and which, despite this, can be used to polish the main surface of a glass substrate at a high rate. The process for producing a polishing slurry having a pH of 2-7 is characterized by: producing a polishing slurry concentrate which comprises abrasive grains comprising ceria particles or ceria-zirconia solid-solution particles, a dispersant comprising 2-pyridinecarboxylic acid or glutamic acid, and water; dispersing the abrasive grains of the polishing slurry concentrate so that the diameter of the crystallites of the abrasive grains does not decrease by more than 10%; thereafter adding water; and further adding the same dispersant.