ILLUMINATION SYSTEM FOR EUV MICROLITHOGRAPHY

摘要

An illumination system for EUV microlithography comprises an EUV light source (3) which generates EUV illumination light (10) with an etendue that is higher than 0.01 mm2. The EUV light source (3) generates in particular a sequence of EUV light pulses, particularly with a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light (10) from the light source (3) to an object field. At least one optical modulation component (25) of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.