Embodiments described herein provide methods of surface preparation using an electromagnetic beam prior to modification of the surface of a component which advantageously improve the quality of the final texture in those places and correspondingly reduces particle contamination. In one embodiment a method of providing a texture to a surface of a component for use in a semiconductor processing chamber is provided. The method comprises defining a plurality of regions on the surface of a component, moving an electromagnetic beam to a first region of the plurality of regions, scanning the electromagnetic beam across a surface of the first region to heat the surface of the first region, and scanning the electromagnetic beam across the heated surface of the first region to form a feature.
申请公布号
WO2010039760(A2)
申请公布日期
2010.04.08
申请号
WO2009US58921
申请日期
2009.09.30
申请人
APPLIED MATERIALS, INC.;WEST, BRIAN T.;BOYD, JR., WENDELL;TAN, SAMANTHA