| 摘要 |
<p>A film forming apparatus is provided with: a transfer mechanism which transfers a substrate; a supply source which supplies a film forming material so as to form a film on the substrate transferred by the transfer mechanism; a blocking member which is arranged between the transfer mechanism and the supply source and defines, in the substrate transfer direction, a first region wherein the supply of the film forming material to the substrate is blocked, a second region which is adjacent to the first region and in which the film forming material is supplied to the substrate, and a third region which is adjacent to the second region and in which the supply of the film forming material to the substrate is blocked; a first heating section, a second heating section and a third heating section which are arranged in the first region, the second region and the third region, respectively, so as to heat the substrate transferred by the transfer mechanism, and include a plurality of heaters, respectively; a position detector which detects the position of the substrate in the transfer direction; and a controller which controls the first heating section, the second heating section and the third heating section. The supply source operates as a heat generating source, the substrate transferred by the transfer mechanism is heated more strongly in the case where the substrate is positioned in the second region, compared with the cases where the substrate is positioned in the first region or the third region, and the controller separately controls operations of the first heating section, the second heating section and the third heating section so as to reduce temperature nonuniformity of the substrate in the transfer direction, corresponding to the substrate position detected by the position detector.</p> |
