发明名称 RADIOFREQUENCY PLASMA REACTOR AND METHOD FOR MANUFACTURING VACUUM PROCESS TREATED SUBSTRATES
摘要 <p>An electrode (3i) of a radiofrequency parallel plate plasma reactor comprises an electrode surface of a multitude of surfaces of metal members (28) which reside on dielectric spacing members (29), whereby the metal members (28) are mounted in an electrically floating manner. The dielectric members (29) are mounted, opposite to the metal members (28), upon a metal Rf supply body (14a).</p>
申请公布号 WO2010037716(A1) 申请公布日期 2010.04.08
申请号 WO2009EP62538 申请日期 2009.09.28
申请人 OERLIKON SOLAR IP AG, TRUEBBACH;JOST, STEPHAN 发明人 JOST, STEPHAN
分类号 H01J37/32 主分类号 H01J37/32
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