| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask for suppressing an exposure defect, and to provide an exposure method, and a device manufacturing method. <P>SOLUTION: The mask M is used, which includes a pellicle frame 120 for correcting non-linear deformation, which is caused in the temperature distribution of a mask body 100, to be linear deformation. <P>COPYRIGHT: (C)2010,JPO&INPIT |
