| 摘要 |
PROBLEM TO BE SOLVED: To provide the inspection method of a color filter detecting color omission N2 and color overlap K2 caused by angled dislocation of colored pixel patterns on a color filter substrate. SOLUTION: Information on the pixel region of one end part c of the color filter substrate 10 and information on the pixel region of the other end part d are detected respectively by an imaging device 12 and the respective pieces of information are compared with each other to detect the color omission and the color overlap. The detected information is specified to be a color saturation average value obtained from each pixel of an imaged region. The information of the other end part is subtracted from the information of the one end part and when the resultant value is out of a preset value, it is detected that a defect is present. COPYRIGHT: (C)2010,JPO&INPIT |
