发明名称 PHOTOSENSITIVE POLYIMIDES
摘要 The invention pertains to an epoxy-modified photosensitive polyimide, which possesses excellent heat resistance, chemistry resistance, and flexibility, and can be used in a liquid photo resist or dry film resist, or used in a solder resist, coverlay film, or printed circuit board.
申请公布号 US2010086871(A1) 申请公布日期 2010.04.08
申请号 US20090534173 申请日期 2009.08.03
申请人 ETERNAL CHEMICAL CO., LTD. 发明人 CHOU MENG-YEN;LEE CHUAN ZONG
分类号 G03F7/004;C08G73/10 主分类号 G03F7/004
代理机构 代理人
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