发明名称 PHASE CHANGE MEMORY CELLS AND FABRICATION THEREOF
摘要 <p>A phase change memory cell, e.g. a line-cell (2), and fabrication thereof, the cell comprising: two electrodes (6, 8); phase change memory material (10) and a dielectric barrier (12). The dielectric barrier (12) is arranged to provide electron tunnelling, e.g. Fowler-Nordheim tunnelling, to the phase change memory material (10). A contact (15) made of phase change memory material may also be provided. The dielectric barrier (12) is substantially uniform e.g. of substantially uniform thickness, e.g. = 5nm.</p>
申请公布号 WO2010038216(A1) 申请公布日期 2010.04.08
申请号 WO2009IB54313 申请日期 2009.10.02
申请人 NXP B.V.;INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW;KOCHUPURACKAL, JINESH, B. P.;WOLTERS, ROBERTUS, A. M.;ZANDT, MICHAEL, A. A. 发明人 KOCHUPURACKAL, JINESH, B. P.;WOLTERS, ROBERTUS, A. M.;ZANDT, MICHAEL, A. A.
分类号 H01L45/00 主分类号 H01L45/00
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