发明名称 |
NANO-IMPRINT LITHOGRAPHY TEMPLATES |
摘要 |
Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
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申请公布号 |
US2010084376(A1) |
申请公布日期 |
2010.04.08 |
申请号 |
US20090572838 |
申请日期 |
2009.10.02 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
KHUSNATDINOV NIYAZ;LIU WEIJUN;XU FRANK Y.;WAN FEN;FLETCHER EDWARD BRIAN;MENEZES MARLON |
分类号 |
B44C1/22;B29C59/00;H05B6/00 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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地址 |
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