发明名称 NANO-IMPRINT LITHOGRAPHY TEMPLATES
摘要 Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
申请公布号 US2010084376(A1) 申请公布日期 2010.04.08
申请号 US20090572838 申请日期 2009.10.02
申请人 MOLECULAR IMPRINTS, INC. 发明人 KHUSNATDINOV NIYAZ;LIU WEIJUN;XU FRANK Y.;WAN FEN;FLETCHER EDWARD BRIAN;MENEZES MARLON
分类号 B44C1/22;B29C59/00;H05B6/00 主分类号 B44C1/22
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