EXPOSURE APPARATUS, SUPPORTING APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus (11) is provided with an exposure apparatus main body (15) and a supporting apparatus (14).  The exposure apparatus main body (15) has an illuminating optical system (17) which guides exposure light (EL) emitted from a light source device (12) to a reticle, and a projection optical system (19) which projects the image of a predetermined pattern on a wafer.  The supporting apparatus (14) is arranged below the exposure apparatus main body (15) and supports the exposure apparatus main body (15).  The supporting apparatus (14) is provided with a supporting table (51) which supports the exposure apparatus main body (15) from below.  In the supporting table (51), a turbo-molecular pump (63) which depressurizes inside the exposure apparatus main body (15) is stored.