| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treatment agent for freezing process and a method of forming a resist pattern using the same, meeting the requirement that in a double patterning method, dimensions of a first resist pattern are not varied by a freezing process conducted for the first resist pattern and formation of a second resist pattern. <P>SOLUTION: The surface treatment agent for forming a resist pattern contains a compound having two or more aziridinyl groups and polymer or oligomer inactive to the compound and the resist pattern. <P>COPYRIGHT: (C)2010,JPO&INPIT |
