| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask inspection method which detects a foreign matter such as dust on a photomask with high sensitivity by suppressing erroneous detection due to an influence of noise. <P>SOLUTION: In the photomask inspection method, image data of the photomask having regions with different layer structures on a surface thereof is acquired, and inverted image data is created by subtracting the image data from tone value data of the regions, and offset inverted image data is created by raising pixel values of the inverted image data by a fixed amount, and normalized correlation image data is created by computing a normalized correlation between the offset inverted image data and an offset Gaussian distribution-type kernel, and a foreign matter is detected by comparing the normalized correlation image data with a predetermined threshold. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
