A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units, each of which comprises a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.
申请公布号
WO2010037476(A2)
申请公布日期
2010.04.08
申请号
WO2009EP06718
申请日期
2009.09.17
申请人
CARL ZEISS SMT AG;BLEIDISTEL, SASCHA;KWAN, YIM-BUN-PATRICK;BACH, FLORIAN;BENZ, DANIEL;WALDIS, SEVERIN;WERBER, ARMIN