发明名称 GAS BARRIER FILM
摘要 <p>A gas barrier film wherein a vapor deposition layer composed of an inorganic compound and a gas barrier layer are sequentially formed on at least one side of a base film which is composed of a polyester film.  The gas barrier layer is formed from a mixture containing: a base material which is composed of a copolymer obtained using at least two components, namely (a) an unsaturated nitrile accounting for 10-30% by mass of the copolymer and (b) an unsaturated compound having a hydroxy group and accounting for 30-70% by mass of the copolymer, as monomers; (c) a curing agent composed of a compound having an isocyanate group; and (d) a compound having two or more carboxylic acid groups or one or more carboxylic anhydride groups.</p>
申请公布号 WO2010038755(A1) 申请公布日期 2010.04.08
申请号 WO2009JP66994 申请日期 2009.09.30
申请人 TORAY INDUSTRIES, INC.;UEBAYASHI, HIROYUKI;ARAI, TAKASHI;HIROTA, KUSATO 发明人 UEBAYASHI, HIROYUKI;ARAI, TAKASHI;HIROTA, KUSATO
分类号 B32B27/36;B32B9/00;B65D65/40;C08K5/09;C08K5/29;C08L33/20;C23C14/08 主分类号 B32B27/36
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