| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method for improving performance, efficiency, and/or a function of a device manufactured by using lithography. <P>SOLUTION: A lithographic method includes a step of using information at least indicative of a desired shape or size of a constituent part of a device to implement the desired shape or size of the constituent part of the device. The desired shape or size is related to a measured property of a layer of material in which the constituent part of the device is to be created. At least a part of the implementation process comprises a step of determining a configuration of a plurality of individually controllable elements that would be necessary to create in a radiation beam a pattern which is sufficient to implement the desired shape or size of the constituent part of the device when creating the constituent part of the device. <P>COPYRIGHT: (C)2010,JPO&INPIT |
