发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition exhibiting excellent alkali developability and an extremely small warpage by curing shrinkage. <P>SOLUTION: The alkali developable photosensitive composition (Q) contains a hydrophilic resin (A), a polyfunctional (meth)acrylate monomer (B), a carboxyl group-modified cellulose (C) having an aromatic ring in the molecule, and a photo-radical polymerization initiator (D). <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010079163(A) 申请公布日期 2010.04.08
申请号 JP20080249922 申请日期 2008.09.29
申请人 SANYO CHEM IND LTD 发明人 AZUMA KEIICHIRO;YAMAMOTO YUSUKE
分类号 G03F7/004;G03F7/027;G03F7/032;H05K3/28 主分类号 G03F7/004
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