SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To reduce the tact time of processing operation for supplying or coating a substrate to be processed with a process liquid using a spinless system, and to form a coating of the process liquid on the substrate with a uniform thickness without uneven coating by a floating carrying system. SOLUTION: In the resist-coating unit (CT) 40, a stage 76 which floats substrates G in the air with the force of air pressure has a carry-in region M1; a coating region M3and a carry-out region M5, which are divided in the substrate transport direction and are lined up. The carry-in region M1is larger than the size of the substrates G and carries in new substrates G to be coated. The coating region M3is smaller than the size of the substrates G, and the substrates G are supplied with resist liquid R from a resist nozzle 78 above them, when they pass through the region M3. The carry-out region M5is larger than the size of the substrates G, and the coated substrates G are carried out from the carry-out region M5. COPYRIGHT: (C)2010,JPO&INPIT