发明名称 EXPOSURE HEAD AND IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a technology for achieving the formation of a favorable latent image in such a constitution that exposure regions of different imaging optical systems overlap each other. <P>SOLUTION: The exposure head is equipped with a plurality of light emitting elements 2951 arranged in a first direction LGD and image side tele-centric imaging optical systems which form condensing parts SG to an exposure surface by imaging light from the plurality of light emitting elements 2951. The different imaging optical systems can be formed by overlapping the condensing parts SG seen from a second direction SD orthogonal or nearly orthogonal to the first direction MD. The plurality of light emitting elements 2951 include light emitting elements EL_1 arranged at a first light emitting element intercentral distance Del_1 in the first direction LGD and light emitting elements EL_2 arranged at a second light emitting element intercentral distance Del_2 different from the first light emitting element intercentral distance Del_1 in the first direction LGD. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010076390(A) 申请公布日期 2010.04.08
申请号 JP20080250624 申请日期 2008.09.29
申请人 SEIKO EPSON CORP 发明人 SOWA KEN;NOMURA YUJIRO
分类号 B41J2/44;B41J2/45;B41J2/455;G02B3/00;G02B13/26;G03G15/01;G03G15/04;H04N1/036 主分类号 B41J2/44
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