发明名称 MEMS STRUCTURE AND METHOD OF MANUFACTURING THE SAME
摘要 An MEMS structure and a method of manufacturing the same are provided. The MEMS structure includes a substrate and at least one suspended microstructure located on the substrate. The suspended microstructure includes a plurality of metal layers, at least one dielectric layer, and at least one peripheral metal wall. The dielectric layer is sandwiched by the metal layers, and the peripheral metal wall is parallel to a thickness direction of the suspended microstructure and surrounds an edge of the dielectric layer.
申请公布号 US2010084723(A1) 申请公布日期 2010.04.08
申请号 US20090348322 申请日期 2009.01.05
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHEN JEN-YI;WANG CHIN-HORNG
分类号 H01L29/84;H01L21/34 主分类号 H01L29/84
代理机构 代理人
主权项
地址