发明名称 Nano-crystal diamond film, manufacturing method thereof, and device using nano-crystal diamond film
摘要 A nano-crystal diamond film synthesized on a substrate and containing, as a major component, nano-crystal diamond having a grain diameter from 1 nm to less than 1000 nm. This nano-crystal diamond film can be formed on a substrate by means of a plasma CVD method using a raw material gas containing a hydrocarbon and hydrogen, allowing the formation of the nano-crystal diamond film to take place outside the plasma region. This nano-crystal diamond film is applicable to the manufacture of an electrochemical device, an electrochemical electrode, a DNA chip, an organic electroluminescent device, an organic photoelectric receiving device, an organic thin film transistor, a cold electron-emission device, a fuel cell and a catalyst.
申请公布号 US2010084634(A1) 申请公布日期 2010.04.08
申请号 US20060598680 申请日期 2006.11.14
申请人 TOPPAN PRINTING CO., LTD.;NATIONAL INSTITUTE FOR MATERIALS SCIENCE 发明人 GAMO HIDENORI;ANDO TOSHIHIRO
分类号 H01L51/10;B01J21/18;B32B5/16;B32B37/00;C23C16/27;C23C16/44;C30B25/02;C30B25/10;C30B29/04;C30B29/60;G01N27/26;G01N33/48;G03F7/00;H01L31/00;H01L51/52;H01M4/86 主分类号 H01L51/10
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