| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing sheet used in a polishing pad for use in polishing, and capable of moderating a degree of abrasion and stabilizing polishing performance. <P>SOLUTION: The polishing pad includes a urethane sheet having a polishing surface. The urethane sheet is formed of a mixture of a polyisocyanate compound, a polyol compound, a polyamine compound, water and a nonreactive gas, and has a foam structure. In the urethane sheet, a content HSC of hard segments is controlled to be in a range of 32-42%, an equivalence ratio R in a range of 0.7-0.9, a bulk density D in a range of 0.45-0.55 g/cm<SP>3</SP>, and hardness A is controlled to be 85 or higher, respectively. Abrasion loss on the polishing surface shows characteristics ranging from 100 to 200 mg. The content HSC, the equivalence ratio R, the bulk density D and the hardness A respectively relate to the degree of abrasion and likelihood of clogging of the urethane sheet 2. <P>COPYRIGHT: (C)2010,JPO&INPIT |
