| 发明名称 |
NEW RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new resin and a photoresist containing the same effectively forming an image by using radiation at 200 nm or shorter such as 193 nm radiation. <P>SOLUTION: The resin comprises a repeating unit having a carbocyclic aryl group substituted with one or more heteroatom-containing groups, in particular, a carbocyclic aryl group substituted with one or more oxygen/sulfur atom-containing groups. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010077441(A) |
申请公布日期 |
2010.04.08 |
| 申请号 |
JP20090259996 |
申请日期 |
2009.11.13 |
| 申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
BARCLAY GEORGE G;BAE YOUNG C |
| 分类号 |
C08F212/14;G03F7/033;G03F7/004;G03F7/038;G03F7/039;H01L21/027 |
主分类号 |
C08F212/14 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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