发明名称 IMMERSION EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an immersion exposure device which quickly detects a liquid spilling from a substrate stage onto a surface plate. <P>SOLUTION: The immersion exposure device includes a projection optical system 13 for projecting a pattern of an original R onto a substrate W and exposes the substrate W with a liquid filled in a space between the last surface of the projection optical system 13 and the substrate W. The immersion exposure device is provided with a substrate stage WST holding the substrate W and moving on a surface plate 200 and a sensor 100 disposed on a side surface of the substrate stage WST to detect a liquid 110 on the surface plate. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010080785(A) 申请公布日期 2010.04.08
申请号 JP20080249130 申请日期 2008.09.26
申请人 CANON INC 发明人 SEKIGUCHI HIROYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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