发明名称 |
SOLID-STATE IMAGING DEVICE, SEMICONDUCTOR DEVICE, AND METHODS OF MANUFACTURING THE DEVICES |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To enhance the withstand voltage of a vertical transistor. <P>SOLUTION: When forming the vertical transistor, a gate electrode 22g is formed of a semiconductor in which conductive impurities are diffused. The impurities are diffused, in the gate electrode 22g, so that the impurity concentration on the bottom side disposed in a substrate 101 is lower than the impurity concentration on the front side of the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2010080739(A) |
申请公布日期 |
2010.04.08 |
申请号 |
JP20080248501 |
申请日期 |
2008.09.26 |
申请人 |
SONY CORP |
发明人 |
HIYAMA SUSUMU;HIRANO TOMOYUKI |
分类号 |
H01L27/146;H01L21/8234;H01L27/06;H01L27/088 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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