发明名称 SOLID-STATE IMAGING DEVICE, SEMICONDUCTOR DEVICE, AND METHODS OF MANUFACTURING THE DEVICES
摘要 <p><P>PROBLEM TO BE SOLVED: To enhance the withstand voltage of a vertical transistor. <P>SOLUTION: When forming the vertical transistor, a gate electrode 22g is formed of a semiconductor in which conductive impurities are diffused. The impurities are diffused, in the gate electrode 22g, so that the impurity concentration on the bottom side disposed in a substrate 101 is lower than the impurity concentration on the front side of the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010080739(A) 申请公布日期 2010.04.08
申请号 JP20080248501 申请日期 2008.09.26
申请人 SONY CORP 发明人 HIYAMA SUSUMU;HIRANO TOMOYUKI
分类号 H01L27/146;H01L21/8234;H01L27/06;H01L27/088 主分类号 H01L27/146
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