| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspecting apparatus of a substrate and an inspecting method of a substrate, for determining inspection conditions without repeatedly radiating electron ray to the same inspection region. Ž<P>SOLUTION: The electron ray is radiated to a substrate where a circuit pattern is formed and a generated secondary electron is detected. The detected signal is made into an image and is stored. The stored image is compared with a second image formed from the other identical circuit pattern. Based on a preset defect discrimination condition, a defect of the substrate is extracted from the comparison result. The inspecting apparatus includes a storage part in which an image of the region within a range of a substrate, from one end to the other end, is accumulated, and a defect determination part for repeatedly determining defects by utilizing the image accumulated in the storage part under a defect determination condition different from the preset defect determination condition. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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