发明名称 METHOD FOR PRODUCING SIC SINGLE CRYSTAL
摘要 5 to 30 at % of Ti and 1 to 20 at % of Sn or 1 to 30 at % of Ge are added to an Si melt, and SiC single crystal are grown from SiC seed crystal by holding the SiC seed crystal immediately beneath the surface of the Si melt in a graphite crucible while maintaining temperature gradient descending from the inner side of the Si melt to the surface of the melt.
申请公布号 US2010083896(A1) 申请公布日期 2010.04.08
申请号 US20080528332 申请日期 2008.06.10
申请人 TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 SAKAMOTO HIDEMITSU
分类号 C30B17/00 主分类号 C30B17/00
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