发明名称 |
Particle beam system e.g. transmission electron microscope, in semiconductor industry, has source and particle beam formation elements formed for producing electron beam and arranged together with gas supply system in inner chamber |
摘要 |
<p>The system (1) has a gas supply system (55) with a reservoir (57) made of polymer for accommodating an active substance and a cable (59) for supplying the substance to an extractor electrode (21), a radiation pipe (25) and a radiation limiting screen (29). Vacuum walls (9', 9'') limit an evacuatable inner chamber (13). An electron source (17), the electrode, the pipe and the screen are formed for producing a primary electron beam (15) and guiding the beam to an object region (33). The source, the electrode, the pipe and the screen are arranged together with the supply system in the chamber. An independent claim is also included for a method for operating a particle beam system.</p> |
申请公布号 |
DE102008049655(A1) |
申请公布日期 |
2010.04.08 |
申请号 |
DE20081049655 |
申请日期 |
2008.09.30 |
申请人 |
CARL ZEISS NTS GMBH |
发明人 |
ROSENTHAL, ALEXANDER;BUEHLER, WOLFRAM;DOEMER, HOLGER;STEBLER, CAMILLE;WANZENBOECK, HEINZ |
分类号 |
H01J37/317;H01J37/09 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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