A SEMICONDUCTOR, AN APPARATUS AND A METHOD FOR PRODUCING IT

摘要

PURPOSE: A semiconductor, an apparatus and a method for producing the same are provided to form an etching pattern which is finer than a resister pattern by forming a passivation film on a glass substrates using a SiN film. CONSTITUTION: Supply tubes(71, 72) supply the silicon gas including the hydrogen component or the halogen element to a first chamber. A supply pipe(74) supplies the nitrogen gas to the first chamber. A supply tube(75) supplies the inactive gas to the first chamber. The supply tubes are connected to a collective pipe(13) through a valve(16) and a mass flow controller(15). A valve(14) for replacing the gas is installed on the collective pipe.