| 摘要 |
A small-sized low-power-loss capacitor having low parasitic resistance is obtained by adopting metal wires as wires in a line and space structure to utilize capacitances between adjacent metal wires. A plurality of wires (3) each extending in a direction (x) and composed of metals such as Al and Cu are aligned in a direction (y) at predetermined intervals, forming a line and space structure (4). The line and space structure (4) is formed on a silicon substrate (1). On the silicon substrate (1), an insulation film (2) composed for example of a silicon oxide film is formed to provide electrical isolation between adjacent wires (3). |
