| 摘要 |
<p>PURPOSE: A peripheral exposure apparatus and a method thereof are provided to reduce the time that takes for an exposure process by implementing the peripheral exposure by controlling a position of a substrate from a measurement result. CONSTITUTION: An exposure table(15) keeps a round substrate(SW). Expose units(31a, 31b, 31c) are installed on a side of the round substrate. A driving part drives the exposure table and the expose unit to a first direction. An inclination calculator calculates an inclination of the round substrate from the first direction. A controller(90) relatively drives the exposure table and the expose unit.</p> |
