| 摘要 |
PROBLEM TO BE SOLVED: To obtain an oniunm salt excellent in resolution and focal point margin, having sight fluctuations of line width and slight deterioration of shape even when post exposure delay(PED) extends over a long time, causing few foreign materials after coating, development and peeling, excellent in pattern profile shape after the development, having high resolution suitable for fine processing and capable of remarkably exhibiting power in especially far ultraviolet lithography. SOLUTION: This onium salt is represented by formula 1 (wherein R1 denotes H or a 1-6C linear, branched or cyclic alkyl group or phenyl group; R2 denotes H, a 1-6C linear, branched or cyclic alkyl group or phenyl group; R3s may each be the same or different and denote each a 1-10C linear, branched or cyclic substituted or unsubstituted alkyl group or a 6-14C substituted or unsubstituted aryl group; M denotes S or I; and a is 3 when M is S and a is 2 when M is I). |
