发明名称 |
METHOD FOR DETECTING ABNORMAL PLACEMENT STATE OF SUBSTRATE, SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING APPARATUS |
摘要 |
<p>Provided is a method for detecting an abnormal placement state of a substrate (W), wherein an abnormality of a placement state of the substrate (W) is detected at the time of processing the substrate (W) while heating the substrate placed on a substrate placing table (3) whereupon heaters (6a, 6b) are arranged. The method for detecting an abnormal placement state of the substrate (W) is provided with a step of detecting the maximum value and the minimum value of electrical output or measured temperatures or the integrated value of the electrical output or the measured temperatures, based on information of the electrical output to the heaters (6a, 6b) or measured temperature information of the substrate placing table (3), while one substrate (W) is being processed, and a step of determining the abnormal placement state of the substrate, based on the detected maximum value and the minimum value or the integrated value.</p> |
申请公布号 |
WO2010038674(A1) |
申请公布日期 |
2010.04.08 |
申请号 |
WO2009JP66644 |
申请日期 |
2009.09.25 |
申请人 |
TOKYO ELECTRON LIMITED;CHINO TAKASHI;GOMI SATOSHI;MIYASHITA KOICHI;NAGASAWA MINORU;EDA YOSHIE |
发明人 |
CHINO TAKASHI;GOMI SATOSHI;MIYASHITA KOICHI;NAGASAWA MINORU;EDA YOSHIE |
分类号 |
H01L21/683;C23C16/52;H01L21/02;H01L21/205;H01L21/3065;H01L21/31;H01L21/324 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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