POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION

摘要

PURPOSE: A positive type photosensitive resin composition is provided to ensure high-sensitivity, high definition, excellent residue elimination, and good patterns and to maintain the balance of solid content and viscosity even with a small amount of polybenzoxazole precursor. CONSTITUTION: A positive type photosensitive resin composition comprises (A) 100.0 parts by weight of a polybenzoxazole precursor having a repeating unit represented by chemical formula 1, (B) 5 -100.0 parts by weight of photosensitive diazoquinone compound, (C) 0.1-30 parts by weight of a silane compound, (D) 10-100.0 parts by weight of polyamic acid ester compound, and (E) a solvent.