发明名称 Imprint lithography
摘要 A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
申请公布号 US7692771(B2) 申请公布日期 2010.04.06
申请号 US20050138899 申请日期 2005.05.27
申请人 ASML NETHERLANDS B.V. 发明人 KOLESNYCHENKO ALEKSEY YURIEVICH;VAN SANTEN HELMAR;KRUIJT-STEGEMAN YVONNE WENDELA
分类号 G03B27/02;G03B27/20 主分类号 G03B27/02
代理机构 代理人
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