BLANK MASK FOR EUV AND PHOTOMASK MANUFACTURED THEREOF

摘要

PURPOSE: A blank-mask for extreme ultraviolet radiation and a photomask manufactured using the same are provided to produce a blank-mask of excellent quality by reducing a shadowing effect by forming a pattern close to the incident angle of an exposed light by changing the composition ratio of an absorption film, density, and a deposition condition. CONSTITUTION: A reflective film(20) of multilayer is formed on an LTEM(Low Thermal Expansion Material) substrate. The conductive film is formed on a rear side of the LTEM substrate. A capping layer(30) is formed to protect the reflective film. A buffer layer(40) is formed on the capping layer. An absorption film(50) is formed on the buffer layer. A hard mask film(60) is formed on the absorption film.