<p>PURPOSE: A mask repair apparatus and a method thereof are provided to repair a mask efficiently by using an irradiating laser to remove foreign material on the mask and digging out the foreign material with a needle. CONSTITUTION: A laser part(210) irradiates a laser on foreign material in order to eliminate the foreign material. A needle portion(300) applies the physical power to the foreign material so that the foreign material can be removed. An optical part(220) enables the laser to be emitted from the laser part to reach the foreign material. The material of the needle portion is comprised of tungsten. The optical part comprises a beam splitter, a lens, a filter, and a shutter.</p>
申请公布号
KR20100035512(A)
申请公布日期
2010.04.05
申请号
KR20080094937
申请日期
2008.09.26
申请人
CHARM & CI CO., LTD.
发明人
YEOM, JONG SUP;LEE, JAE YONG;YANG, JEONG BOK;JO, JANG HO;KIM, JUN RAE;LEE, KEUN HAENG;SHIN, GYU SUNG;PARK, JIN CHUL;KIM, KI WAN;HONG, SOK YONG;YANG, HEE CHANG;PARK, NOH HEON;CHO, SUNG HWAN;KIM, HYUN JUNG