SUBSTRATE CLEANING METHOD FOR REMOVING OXIDE FILM

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method for a surface treatment by removing natural oxide films or organic materials without impairing the flatness of a substrate surface.

SOLUTION: Radicals in plasma are introduced into a processing chamber through radical passage holes (111) of a plasma confining electrode plate (110) for separating plasma, and a processing gas is introduced to the processing chamber and is mixed with the radicals in the processing chamber (121). The substrate surface is cleaned by the mixed atmosphere of the radicals and the processing gas.

COPYRIGHT: (C)2010,JPO&INPIT