METHOD FOR MANUFACTURING WAVEGUIDE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a waveguide for obtaining the waveguide having a narrower mesa shape and a smooth sidewall. SOLUTION: The method for manufacturing the waveguide includes steps of: preparing a first substrate having a slab waveguide layer; depositing a silicon oxide film on the first substrate; forming a mask layer having a predetermined pattern apertures thereon; removing the silicon oxide film in the aperture and removing a part of the silicon oxide film adjacent to this under the mask layer by using the mask layer as a mask; forming a layered structure of a first metal and a second metal having lower etching selectivity than the slab waveguide layer on the mask layer and on the slab waveguide layer; removing the mask layer and the silicon oxide film; patterning the slab waveguide layer by using the second metal as a mask to form a mesa waveguide; and lifting off the second metal together with the first metal. COPYRIGHT: (C)2010,JPO&INPIT