| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask case preventing top and back surfaces of a photomask from coming into contact with a support body of the photomask case, because particles derived from a support body of a photomask case and depositing on a mask are apt to remain even after a cleaning process, and because scratches on a mask can not be eliminated by cleaning. <P>SOLUTION: The photomask case for keeping a photomask is characterized in that: an outer container covering the periphery of a photomask has a support rod insertion hole; the side face of the photomask is held by a support rod inserted through the support rod insertion hole; and the support rod has a support body having elasticity at the top end of the rod to come into contact with the side face of the photomask. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
