发明名称 PATTERN INSPECTION METHOD AND PATTERN INSPECTION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To solve a following problem with defect inspection on a circuit pattern using image processing: there is a risk that an error equating with one pixel occurs owing to displacement not larger than one pixel when an image is turned into a binarized image in image capturing and the error acts as a detection error when detecting whether any defect exists or not by comparison with standard data acquired by expanding/contracting image data serving as a reference. Ž<P>SOLUTION: A pattern inspection device includes: a displacement measuring part 20 measuring, on the order of one pixel size or less, a positional error between image data on an inspected body and reference image data by using a specific domain of each of the respective groups of image data; and a rectifying part for rectifying the positioning of the yet-to-be-binarized image data on the order of sub-pixels. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010071892(A) 申请公布日期 2010.04.02
申请号 JP20080241626 申请日期 2008.09.19
申请人 TORAY IND INC 发明人 SASAMOTO HIROKATA;SUGIHARA HIROKI;TOKUDA YOSHINORI
分类号 G01N21/956 主分类号 G01N21/956
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