| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing various forms of replica molds for nano imprint using nano imprint and a dry etching process; and a method of forming a multi-step pattern or a micro pattern using a nano imprint process with the manufactured replica molds for nano imprint. Ž<P>SOLUTION: There is provided a process method for easily manufacturing various forms of molds which have disadvantages in applying a nano imprint process by using nano imprint and a dry etching process by patterning a molding resin of a substrate having a metal pattern patterned thereon, and forming a nano-class pattern and a complicated three-dimensional micro pattern using a nano imprint process with the manufactured molds without executing a complicated process several times. Thereby, a large-area micro pattern can be formed, a semiconductor process can be applied to a pattern of several tens of nanometers, and reduction of process expense, reduction of process time and improvement of manufacturing yield can be achieved. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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