发明名称 HEATING DEVICE, COATING AND DEVELOPING DEVICE, AND HEATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a coating and developing device which can save a space and has high throughput. SOLUTION: A coating part for forming a coating film and a heating device for heating a substrate are provided to both sides of a substrate conveyance path linearly extending from the carrier block side to the side of an interface part, respectively. The heating device includes: a heating plate arranged at the back side when viewed from the substrate conveyance path; a cooling plate provided on the side of the substrate conveyance path rather than the heating plate; and an exclusive conveyance mechanism exclusive for conveying the substrate between both plates. Then, such coating blocks are provided by being vertically laminated. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010074185(A) 申请公布日期 2010.04.02
申请号 JP20090287783 申请日期 2009.12.18
申请人 TOKYO ELECTRON LTD 发明人 HAYASHI SHINICHI;FUKUOKA TETSUO;ODA TETSUYA;INATOMI HIROAKI
分类号 H01L21/027;H01L21/677 主分类号 H01L21/027
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