发明名称 SEMICONDUCTOR APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent malfunctions of a circuit by suppressing the generation of a displacement current charging/discharging parasitic capacity formed of an insulation film between a support substrate and an active layer caused by a dv/dt surge. SOLUTION: The support substrate 2 is left only below a low-potential reference circuit LV and a high-potential reference circuit HV. Accordingly, a part below the low-potential reference circuit LV and a part below the high-potential reference circuit HV among the support substrate 2 are brought into states of being insulated by an insulation member 30. Furthermore, both the high-potential reference circuit HV and support substrate 2 and the low-potential reference circuit LV and the support substrate 2, or at least the high-potential reference circuit HV and the support substrate 2 are held at the same potential. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010074178(A) 申请公布日期 2010.04.02
申请号 JP20090263881 申请日期 2009.11.19
申请人 DENSO CORP 发明人 SONE HIROKI;YAMADA AKIRA
分类号 H01L29/786;H01L21/76;H01L21/762;H01L21/764;H01L27/08;H01L27/12 主分类号 H01L29/786
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