| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask that provides a seam area in a screen center of a color filter, the photomask eliminating chipping in alignment control protrusions caused even when a gap is provided between light shielding units of a left random area and a right random area. <P>SOLUTION: The photomask is characterized in that: (1) the photomask includes a left random area 12L, a pattern area 12 and a right random area 12R; (2) a uniform array of mask patterns 32 is formed in the pattern area, while in the right random area, mask patterns are randomly distributed and reduced in number to the right (a right-random state) and in the left random area, mask patterns are randomly distributed and reduced in number to the left (a left-random state), wherein the mask patterns of the right-random state and the left-random state are in a complementary relationship with each other to give a uniform array when combined together; and (3) a light shielding unit 33 is formed in each pixel area 31 having no mask pattern in the right random area and in the left random area, and when the light shielding units are adjoining to each other, the light shielding unit is provided as extended between the light shielding units. <P>COPYRIGHT: (C)2010,JPO&INPIT |
