| 发明名称 |
METHOD FOR PRODUCING OXIDE SINTERED COMPACT |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for effectively producing a sputtering target having a bulk resistance value low to a degree at which DC discharge is made possible. <P>SOLUTION: The method for producing an oxide sintered compact is characterized in that raw material powder comprising: a zinc compound containing a zinc atom and oxygen atom; and a tin compound containing a tin atom and oxygen atom is subjected to electrifying sintering in such a manner that DC pulse current is made to flow under pressure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010070410(A) |
申请公布日期 |
2010.04.02 |
| 申请号 |
JP20080238119 |
申请日期 |
2008.09.17 |
| 申请人 |
IDEMITSU KOSAN CO LTD |
发明人 |
UTSUNO FUTOSHI;INOUE KAZUYOSHI |
| 分类号 |
C04B35/453;C04B35/00;C04B35/64;H01B1/08;H01B13/00 |
主分类号 |
C04B35/453 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
