MASK-CLEANING APPARATUS FOR ORGANIC EL, APPARATUS FOR MANUFACTURING ORGANIC EL DISPLAY, ORGANIC EL DISPLAY, AND MASK-CLEANING METHOD FOR ORGANIC EL

摘要

PROBLEM TO BE SOLVED: To provide a cleaning apparatus for removing a vapor deposit which has deposited on a mask for an organic EL, in a completely noncontact state against a substrate. SOLUTION: The mask-cleaning apparatus 1 for removing a vapor deposition substance 20 that has deposited on the mask 2 that has a plurality of apertures formed therein for the organic EL scans a laser beam which has been oscillated in and emitted from a laser beam source 15 onto the surface of the mask 2 for the organic EL in a Y-direction while using a galvano-mirror 16, and scans the whole surface of the mask sheet by moving the mask in an X-direction with a moving section 14. The mask-cleaning apparatus 1 also has a blower portion 17 and a suction portion 18 which forms an air flow in the upper part of the mask 2 for the organic EL, and cleans the mask by crushing the vapor deposition substance 20 by laser scanning, makes the liberated product scatter toward the upper part, and makes the air flow transport the liberated product to remove the product. COPYRIGHT: (C)2010,JPO&INPIT